Greenhouse Mushroom Humidifier

Greenhouse Mushroom Humidifier

Clean room control for humidity control

The significance of humidity control and relative humidity to the clean room: humidity control is an important condition for the production of clean room. Relative humidity is a common environmental control condition in the operation of clean room and clean room.

Typical target values for relative humidity in semiconductor cleanrooms and cleanrooms are controlled in the range of approximately 30 to 50%, allowing for tolerances within a narrow range of ±1%, such as lithography or in extreme ultraviolet processing (DUV) The area is even smaller and can be relaxed to within ±5% of the rest.

In recent years, the process of treating air has been maintained in these prescribed ranges. Relative humidity has a number of factors that may contribute to the overall performance of the clean room, including:

1, bacterial growth; 2, the staff feels comfortable room temperature range; 3, static charge; 4, metal corrosion; 5, water vapor condensation; 6, lithography degradation; 7, water absorption.

Bacteria and other biologically contaminated molds, viruses, fungi, and aphids can actively multiply in environments with relative humidity greater than 60%. Some flora can grow when the relative humidity exceeds 30%. When the relative humidity is between 40% and 60%, the effects of bacteria and respiratory infections can be minimized. Relative humidity in the range of 40% to 60% is also a modest range in which humans feel comfortable. Excessive humidity can make people feel depressed, while humidity below 30% can make people feel dry, skin rupture, respiratory discomfort and emotional discomfort.

High humidity actually reduces the static charge build-up on the clean room and clean room surfaces – a result that everyone hopes. Lower humidity is more suitable for charge accumulation and a potentially damaging source of electrostatic discharge. When the relative humidity exceeds 50%, the static charge begins to dissipate rapidly, but when the relative humidity is less than 30%, they can persist for a long time on the insulator or the ungrounded surface.

Relative humidity between 35% and 40% can be a satisfactory compromise. Semiconductor dust-free workshops and cleanrooms generally use additional controls to limit the accumulation of static charge. The speed of many chemical reactions, including the corrosion process, will increase as the relative humidity increases. All surfaces exposed to the clean room and the air surrounding the clean room are quickly covered with at least one monolayer of water. When these surfaces are composed of a thin metal coating that can react with water, high humidity can accelerate the reaction. Fortunately, some metals, such as aluminum, can form a protective oxide with water and prevent further oxidation reactions. In another case, for example, copper oxide, it is not protective, so it is high. In a humid environment, the copper surface is more susceptible to corrosion.

It can be seen that the dust-free workshop has strict or even strict requirements on humidity, and the dehumidifier solves this problem well in humidity control. The dehumidifier can fundamentally solve the stringent requirements of temperature and humidity in the dust-free workshop.

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